SIGNAL PROCESSING CIRCUIT FOR BEAM PROFILE MONITOR

摘要

PURPOSE:To make it possible to measure the change distribution in a pulse beam at an arbitrary time and to improve the S/N ratio of an output signal by providing first and second switching circuits and a pulse forming device which is connected to an oscillator. CONSTITUTION:A pulse A from an oscillator 4 is formed 11 into a pulse B having the pulse width which is equal to the charging time of capacitors 21 - 2n. First switching circuits 91 - 9n are switched at the same time. The electric charge generated from charged beams are inputted, and the capacitors 21 - 2n are charged. A multiplexer control circuit 5A is operated by the pulse B at the same time when the charging is finished. A charging voltage C is outputted from a multiplexer 6. Meanwhile, second switching circuits 101 - 10n make the capacitors 21 - 2n to be in a short-circuit state by a pulse E formed in the circuit 5A from the pulse B during the time when the charged beams are not measured. Thus noises are suppressed to the minimum degree. A pulse forming device 11 delays the pulse A by a required time when the charge distribution of the pulse beam at an arbitrary time is measured.