| 摘要 |
An electrically programmable and electrically erasable floating gate memory device which includes an integrally formed select device. In the n-channel embodiment, a boron region is formed adjacent to the drain region under the control gate and extends slightly under the floating gate. This region is formed using a spacer defined with an anisotropic etching step. The region, in addition to providing enhanced programming, prevents conduction when over-erasing has occurred, that is, when the erasing causes the cell to be depletion-like.
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