发明名称 MASK FOR EXPOSING DEVICE
摘要 PURPOSE:To allow the easy automatic detection and visual discrimination of the front and rear surfaces as well as vertical and lateral directions of the mask by providing prescribed marks to the mask. CONSTITUTION:A mask substrate 11 for the exposing device is provided with the marks for identifying the front and rear surfaces as well as vertical and lateral directions of the mask 11, e.g.; notches 12, marks 22, etc. The marks 22 may be made into a rectangular shape or character. The automatic detection and visual discrimination of the mask are then facilitated.
申请公布号 JPH02204745(A) 申请公布日期 1990.08.14
申请号 JP19890025071 申请日期 1989.02.03
申请人 SEIKO EPSON CORP 发明人 IWAI KAZUO
分类号 G03F1/00 主分类号 G03F1/00
代理机构 代理人
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