发明名称 STRUCTURE AND MANUFACTURE OF MASK FOR X-RAY EXPOSURE
摘要 PURPOSE:To prevent the lowering of the accuracy of a pattern by forming a plurality of notch sections and mutually isolated X-ray absorptive substance packed layers burying the notch sections to an X-ray shielding frame shaped onto a membrane, the periphery of which is fixed to a housing and which is composed of an X-ray transmitting substance, and consisting of the film of an X-ray absorbing substance. CONSTITUTION:The side 12 of an X-ray shielding frame is divided into, for example, one hundred sections 12B by notch sections 13 in width W. Consequently, the deformation of a membrane by each of the divided sections 12B is brought to one hundredth of the maximum quantity of deformation of the shielding frame before division, and the quantity of each divided section 12B deformed is equalized, thus substantially generating no mutual positional displacement among each X-ray absorber constituting a mask pattern. The notch sections 13 are buried with packed layers 14 make up of the same X-ray absorbing substance as the side 12, and the filling layers 14 are also divided at every notch section 13. Since the filling layers 14 are shaped after the stress of X-ray absorbing substance films organizing the side 12 is dispersed to each divided section 12B, the quantities of displacement at both ends of the side 12 are not changed substantially before and after the formation of the filling layers 14.
申请公布号 JPH02205009(A) 申请公布日期 1990.08.14
申请号 JP19890024291 申请日期 1989.02.02
申请人 FUJITSU LTD 发明人 MARUYAMA SHIGERU;KUDO JINKO;SUGISHIMA KENJI
分类号 G02F1/00;G03F1/00;H01L21/027;H01L21/30 主分类号 G02F1/00
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