| 摘要 |
PURPOSE:To obtain the title polymer adapted for a positive resist material having excellent adhesiveness of the formed pattern, high sensitivity to electron beams or X rays and a high resolution by using a specified fluoroalkyl methacrylate polymer. CONSTITUTION:A polymer containing at least 50wt.% structural units of formula I is used as a positive resist material. It is desirable that the polymer contains 0.5-20wt.% structural units of formula II as a comonomer units in addition to the structural units of formula I. It is also possible that the polymer contains at most 20wt.%, based on te total polymer, structural units of formula III (wherein Rf is a 1-5C fluoroalkyl) in addition to the structural units of formulas I and II. It is desirable that the MW of the above polymer corresponds to an intrinsic viscosity of 0.3-1.5 as measured in methyl isobutyl ketone at 35 deg.C. |
