| 摘要 |
PURPOSE:To easily produce waveguide parts by sticking high-valency electronic ion introduced glass or semiconductor doped glass onto an oxide film to form a transparent glass layer thereby forming the waveguide parts. CONSTITUTION:Grooves 2 are formed on an Si substrate 1 and this Si substrate 1 is oxidized to form silicon dioxide films 3 on the surface on the side formed with the grooves 2. The high-valency electronic ion introduced glass or the semicondcutor doped glass is thereafter stuck onto the silicon dioxide film 3 to form the transparent glass layer 4 which is a thin film of the nonlinear glass. The transparent glass layers in the grooves 2 are formed as the waveguide parts 5 to obtain a waveguide 6. The high-valency electronic ion introduced glass is easily produced in this way. |
