发明名称 HANDOTAISOCHINOSEIZOHOHO
摘要 The semiconductor device, such as a bipolar transistor, is formed in superposed layers doped with various types and concentrations of doping impurities. Said layers forming a thin monocrystalline semiconductor film (11) are supported on the surface of a substrate and contacted electrically with a conductive network on top of thin film (11). Two or several of such devices can be stacked one upon the other and interconnected electrically. …<??>Thin film (11) is produced preferably from a non-monocrystalline semiconductor film having the defined dopant distribution and a tapered region (14) terminating in a point (15). Starting at point (15) the thin film (11) is traversed with a particle beam causing the growth of a monocrystalline thin film (11). …<??>The device and method are useful in the VLSI-technology.
申请公布号 JPH0235468(B2) 申请公布日期 1990.08.10
申请号 JP19810137892 申请日期 1981.09.03
申请人 INTAANASHONARU BIJINESU MASHIINZU CORP 发明人 SUCHIIBUN JOOJI BAABII;JEEMUZU MAAKU RIISU;JEEMUZU ROBAATO ROIDO;ARUNACHARA NAGARAJAN
分类号 H01L29/73;H01L21/02;H01L21/20;H01L21/28;H01L21/3205;H01L21/331;H01L21/74;H01L21/76;H01L21/768;H01L21/822;H01L23/52;H01L27/00;H01L27/12;H01L29/04 主分类号 H01L29/73
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