发明名称 SURFACE TREATMENT FOR THIN METAL OR SEMICONDUCTOR OXIDE COATINGS
摘要 <p>The adherability of a thin coating of a metal or semiconductor oxide, such as indium tin oxide or silicon dioxide, is improved by treating the coating with an aqueous solution containing an effective amount of an active oxygen compound such as sodium hypochlorite or hydrogen peroxide.</p>
申请公布号 WO1990009034(A2) 申请公布日期 1990.08.09
申请号 US1990000267 申请日期 1990.01.12
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址