| 摘要 |
PURPOSE: To prevent the contamination on a wafer by providing a wafer handling arm arranged within a vacuum room and a driving axis extended from the vacuum room to an atmospheric pressure room and operating the rotary moving and the axial direction moving of this driving axis while hermetically sealing the vacuum room respectively by a rotary seal and a fixed seal. CONSTITUTION: The cassette 28 of a wafer 30 is placed on a platform 26 to transfer the wafer one by one by an assembly 34 from the cassette to a finder 32 and additionally onto a rack 41 within a load lock room 22. Next, after partially exhausting the room 22, a plenum valve 49 is opened to energize the load lock room and then a heater 45. While deaerating its wafer batch, the rack within the room 22 is within a staging room 14 and is transferred to a processing room. After the completion of deaerating, a valve 49 is closed and an elevator 47 is operated to move a wafer batch from the load lock room to a vacuum staging room 14. Next an elevator 42 is operated to return the wafer batch to the room 22 and after venting, the wafer is returned to the cassette 28 by an arm 37.
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