发明名称 Method of thinning a silicon wafer using a reinforcing material
摘要 A plate-like body (e.g., a silicon wafer) at least about 0.5 mm thick that is to be thinned is reinforced by applying to one main surface, in adhesive relationship thereto, a coating of a finely divided material which is fused to form a hard mechanically supportive coating. The body is thinned from the second main surface to a thickness less than about 250 mu m. For a silicon body, the mechanically supportive coating comprises at least about 18% silicon.
申请公布号 US4946716(A) 申请公布日期 1990.08.07
申请号 US19880289514 申请日期 1988.12.27
申请人 TEKTRONIX, INC. 发明人 CORRIE, BRIAN L.
分类号 H01L21/302;H01L27/148 主分类号 H01L21/302
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