| 摘要 |
An exposure system is disclosed which uses a pulsed laser, such as an excimer, as the light source for exposure. For exposure control, an acoustooptic element is used. More specifically, the acoustooptic element is used to modulate the intensity of a pulsed laser beam emitted from the excimer laser, to thereby allow precise control of the exposure with respect to a wafer having a resist coating.
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