| 摘要 |
<p>PURPOSE:To obtain the liquid crystal display device use active matrix substrate having a high yield and a high performance by making film thickness of an insulating film being under a display electrode part except a connecting point to at least an active element thicker than film thickness of an insulating film being under a matrix wiring part and protruding it. CONSTITUTION:This active matrix substrate is structured by making film thickness of an insulating film 106 being under a display electrode part 105 except a connecting point to at least an active element thicker than film thickness of an insulating film 104 being under a matrix wiring part, and protruding it. Accordingly, in its area, an even and satisfactory liquid crystal oriented film 113 is formed by rubbing, and a satisfactory liquid crystal display can be executed. Also, damage to an aluminum wiring and a TFT part caused by rubbing is scarcely generated and a structure of a high yield being free from a defect is formed. In such a way, the liquid crystal display device use active matrix substrate having a high yield and a high performance is obtained.</p> |
