PRODUCTION OF NONLINEAR ELEMENT

摘要

PURPOSE:To improve the electric characteristics of the nonlinear element (MIN element) having a structure consisting of a metal-insulator-metal or metal- insulator-transparent conductor and to uniformize the same by removing the property-changed layer of the insulator surface after formation of the insulator in the process for forming the above-mentioned nonlinear element. CONSTITUTION:A protective glass layer 6 consisting of Ta2O5 for protecting the surface of a glass substrate 5 is formed by a sputtering method on the glass substrate 5 at the time of Ta etching. Ta is then formed as the metal 7 by the sputtering method and is patterned by ordinary photoetching. The Ta which is the metal 7 is anodized in an aq. citric acid soln. to form the Ta2O5 as the insulator 8 on the metal 7 surface. The property-changed layer 9 is generated on the surface of the insulator 8 in this stage. The surface of the insulator 8 is then subjected to a sputter etching treatment to remove the property-changed layer 9. For example, ITO is formed by the sputtering method as the transparent conductor 10 in the same vacuum vessel as the vacuum vessel used for the above-mentioned sputter etching. This transparent conductor 10 is patterned by ordinary photoetching.