发明名称 |
Semiconductor device in insulated wells - has reduced series resistance out to use of highly doped polycrystalline layer as dopant source |
摘要 |
The devices consist of a semiconductor substrate (1), an one active region (10a,b) and electrode connections (9,17). The feature is that the electrodes (9,17) are connected to a polycrystalline layer (30a) which has been highly doped, and a diffusion layer (30b) of the same conductivity type formed adjacent by diffusion of dopant from a polycrystalline layer. The active areas are pref. e separated by an insulating layer (2) and contain devices including diffused layers (5,6,13,14) in the top surface of the r regions which together with the electrodes (9,17) form e.g. bipolar or MOS-transistors. USE/ADVANTAGE - Allows formationm of low resistance, more highly doped diffusion layer in single crystalline region to form improved collector of drain contact for devicse made in wells. Lower ON-resistance for field-effect transistors and lower collector-emitter saturation voltage for bipolar transistors.
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申请公布号 |
DE4002673(A1) |
申请公布日期 |
1990.08.02 |
申请号 |
DE19904002673 |
申请日期 |
1990.01.30 |
申请人 |
MITSUBISHI DENKI K.K., TOKIO/TOKYO, JP |
发明人 |
HISAMOTO, YOSHIAKI;YAMAGUCHI, HIROSHI, ITAMI, HYOGO, JP |
分类号 |
H01L21/225;H01L21/74;H01L21/76;H01L21/762;H01L21/8249;H01L27/06;H01L29/78 |
主分类号 |
H01L21/225 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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