发明名称 半導体層の製造方法、光電変換装置の製造方法および半導体層形成用液
摘要 PROBLEM TO BE SOLVED: To manufacture a semiconductor layer containing a group I-II-IV-VI compound by a simple method.SOLUTION: A method for manufacturing a semiconductor layer comprises the steps of: forming a film using a semiconductor layer forming liquid containing a first complex compound represented by structural formula (1) and a group IV-B element; and heating the film to form it into a semiconductor layer containing a group I-II-IV-VI compound.
申请公布号 JP5922348(B2) 申请公布日期 2016.05.24
申请号 JP20110161774 申请日期 2011.07.25
申请人 京セラ株式会社 发明人 小川 浩充
分类号 H01L21/368;H01L31/072;H01L31/18 主分类号 H01L21/368
代理机构 代理人
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