| 摘要 |
A developer solution suitable for use with a positive-working, light-sensitive resist composition derived from a novolac resin and a quinone diazide contains an additive comprising a tetraalkylammonium or phosphonium cation, a benzyltrialkylammonium or phosphonium cation or a benzyltriarylammonium or phosphonium cation which enhances the selectivity of the developer. |
