| 摘要 |
<p>PURPOSE:To form patterns having a resolving-property nearly identical with that of opening patterns by a method wherein the opening patterns are formed in a P-type resist film and after a thin film consisting of a desired material is formed to perform an entire surface etching, the resist film is peeled. CONSTITUTION:Opening patterns 9 are formed in a P-type resist film 8 on a substrate 1, a gelatine film 2 is formed and an entire surface etching is performed until the surface of the film 8 is exposed. Then, an entire surface exposure is performed to develop and the film 8 is peeled to pattern gelatine patterns 2'. Then, the patterns 2' are dyed into a desired color to form first- color color filter patterns 3 and after an intermediate film 4 is formed, second- color color filter patterns 5 and third-color color filter patterns 6 are respectively formed and a protective film 7 is formed. Thereby, patterns, which have a resolution nearly identical with that of the patterns 9 in the film 8 and consist of a desired material, can be formed.</p> |
