System and methods for spin-on coating of self-assembled monolayers or periodic organosilicates on a substrate

摘要

This disclosure relates to a processing system for spin-coating a substrate with Molecular Self-assembly (MSA) chemicals to form photoresist films and/or low dielectric constant (low-k) films on the substrate. The spin-coating processing system may include a spin-coating chamber that can receive and spin-coat MSA chemicals onto the substrate and an annealing chamber to thermally treat the substrate after the spin-coat process. In certain embodiments, the spin-coating processing system may also pre-treat or pre-wet the substrate prior to the spin-coating process.

主权项

1. A method for treating a substrate, comprising:
receiving the substrate in a chemical dispensing system, the substrate comprising an hydroxide layer on a surface of the substrate; dispensing a first solvent solution to pre-wet the surface, the first solvent solution comprising an amount of water no more than 10% by weight; rotating the substrate, after dispensing the first solvent solution, around a center region of the substrate; dispensing a patterning chemical onto the pre-wet surface while rotating the substrate, the patterning chemical comprising:
a carbon compound;a bonding compound coupled to the carbon compound;a terminal compound coupled to the carbon compound that is opposite the bonding compound;a second solvent solution; annealing the substrate following the dispensing of the pattern chemical on the substrate.