| 摘要 |
<p>A process for preparing a photosensitive heat-resistant polymer containing repeating units of the formula: <CHEM> in which R<1> is tetravelent carbocyclic aromatic group or heterocyclic group; R<2> is an aliphatic group having at least 2 carbon atoms, an alicyclic group, an or aliphatic group, a carbocyclic aromatic group, a heterocyclic group or a polysiloxane group; R<3> is a monovalent organic group having a photosensitive unsaturated group; and D is an oxygen or =N-R<3>) which process comprises reacting at a temperature of 0 to 100 DEG C in the presence of a solvent, a photosensitive group-containing isoimide of the formula: <CHEM> in which R<1> and R<2> have the meanings defined above) with a diamine of the formula: H2R<2>-NH2 (II) (in which R<2> has the meaning defined above). n</p> |
