Continuous chemical vapour deposition system.

摘要

A continuous chemical deposition reactor system transfers semiconductor wafers through a reactor having a plurality of process chambers (25). A cassette (20) of wafers is placed for access by a robotic arm (21). Robotic arm (21) lifts wafers from cassette (10) and places them in carriers (22), which move along tracks (33). Junctions (25a) join chambers (25) and allow for introduction and exhaust of process gases. An enclosure (37) surrounds the entire reactor.