发明名称 Contact type image sensor
摘要 A contact type image sensor has a transparent dielectric substrate, an upper transparent electrode, a lower electrode provided on the transparent dielectric substrate, a semiconductor thin film sandwiched between the upper transparent electrode and the lower electrode and constituting a photoelectric conversion part, a transparent dielectric layer formed on a plane of the lower electrode, and an upper electrode formed on the transparent dielectric layer and connected to the upper transparent electrode. The transparent dielectric layer constitutes a capacitance of the image sensor between the upper and lower electrodes.
申请公布号 US4943839(A) 申请公布日期 1990.07.24
申请号 US19880233364 申请日期 1988.08.18
申请人 RICOH COMPANY, LTD.;RICOH RESEARCH INSTITUTE OF GENERAL ELECTRONICS 发明人 KUMANO, MASAFUMI;YAMAMOTO, KENJI
分类号 H01L27/146 主分类号 H01L27/146
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