发明名称 Antistatic resin composition with transparency containing phosphonium sulphonate
摘要 An antistatic resin composition with transparency contains 90-99.9 wt % of a synthetic resin selected from polycarbonate or polymethyl methacrylate and 0.1-10 wt % of a heat-resistant antistat containing phosphonium sulfonate shown by the general formula (I) below: <IMAGE> (I) where A is alkyl group with 1-36 carbon atoms, alkenyl group with 4-24 carbon atoms, phenyl group, phenyl group substituted by alkyl group with 1-18 carbon atoms, naphthyl group or naphthyl group substituted by alkyl group with 1-18 carbon atoms, R1, R2 and R3 are identical, each being an aliphatic hydrocarbon group with 1-8 carbon atoms or aromatic hydrocarbon group, and R4 is a hydrocarbon group with 1-18 carbon atoms.
申请公布号 US4943380(A) 申请公布日期 1990.07.24
申请号 US19890316603 申请日期 1989.02.27
申请人 TAKEMOTO YUSHI KABUSHIKI KAISHA 发明人 SUGIURA, MASATO;SHIMIZU, HIDEO;IMAMURA, SHIGERU;SUGIURA, FUMITOSHI
分类号 C08K5/50 主分类号 C08K5/50
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