| 摘要 |
<p>PURPOSE:To eliminate the white turbidness of a transparent conductive film and to prevent display quality from decreasing by providing a transparent protective insulating film made of a material different from an insulating film on a transparent conductive film. CONSTITUTION:The transparent protective insulating film 2 formed of a silicon nitride film is provided on an electrode 1 made of a transparent conductive film. In this case, the transparent protective insulating film 2 is provided in a low-temperature reducible atmosphere, so even when the transparent protective insulating film 2 is provided on the electrode 1, the electrode 1 is never reduced. Consequently, the electrode 1 never turns turbid in white and minute silicon nitride which is used for a gate insulating film is provided in a high-temperature reducible atmosphere, the electrode 1 is never reduced because the transparent protective insulating film 2 is provided on the electrode 1, so that the electrode never turns turbid in white. Consequently, the light transmissivity of the electrode 1 of a holding capacity element Cad does not decrease, so the display quality never decreases.</p> |
