FAR ULTRAVIOLET RAY-SENSITIVE RESIN COMPOSITION

摘要

PURPOSE:To obtain a far UV-sensitive resin compsn. by incorporating an alkali- soluble resin made of a copolymer of hydroxystyrenes with styrenes other than hydroxystyrenes. CONSTITUTION:This far UV-sensitive resin compsn. contains an alkali-soluble resin made of a copolymer of hydroxystyrenes with styrenes other than hydroxystyrenes and a far UV-sensitive compd. contg. at least one of structures represented by formulae I-III in the molecule. At least one of the structures is used so as to enhance sensitivity and contrast. This resin compsn. has high sensitivity to far UV from KrF eximer laser, etc., and when it is used as a resist, the thickness of a resist film is hardly reduced by an alkaline aq. soln. as a developing soln. and a resist pattern having a clear pattern profile and high resolution is obtd.