| 摘要 |
PURPOSE:To enhance sensitivity, resolution, heat resistance, and a pattern form by forming a photoresist made of a specified 1,2-quinonediazide compound and an alkali-soluble resin. CONSTITUTION:The photosensitive agent to be used for the positive type photoresist comprises the 1,2-quinonediazide compound represented by formula I in which at least 2 of A1-A10 are -O-D, each independent of each other, and D is -R, -COR, or -SO2R; R is alkyl, aralkyl, or aryl; the rest of them are H, halogen, or alkyl, and at least one is a group having a quinone-diazide group; and X is a single bond, -CO-, -COO-, or the like. The positive type photoresist material comprising the alkali-soluble resin and the 1,2-quinonediazide compound can be used for forming a resist patterns by using ultraviolet rays, far ultraviolet rays, electron beams, X-rays, etc., thus permitting sensitivity, resolution, heat resistance, and process stability to be enhanced. |
