| 摘要 |
PURPOSE:To easily produce the above device with simple production equipment by patterning transparent electrodes on color filters by self-alignment with the color filters as a photomask. CONSTITUTION:The plural color filters 22 consisting of a high polymer are formed on a substrate 1. After a transparent conductive film 22 is formed, a photoresist 24 is applied thereon. The photoresist 24 is exposed by using the color filters 22 as the photomask and is developed; thereafter, the transparent conductive film 23 is etched away to allow the transparent conductive film 23 to remain and form only on the color filters 22, by which the transparent electrodes 4 are formed on the color filters. The need for the photomask of high accuracy is eliminated in this way and the stages are vastly simplified and facilitated without having the need for the exact mask alignment. |
