发明名称 |
Pattern inspecting apparatus |
摘要 |
A pattern inspection apparatus for accurately inspecting a pattern such that design image data is processed in correspondence to resizing of a pattern to be inspected. Image data corresponding to an image area of a predetermined size is extracted from input information represented by binary logic levels and representing a pattern to be resized. Template circuits add additional data of a predetermined logic level to a predetermined pixel position when a distribution of the image logic levels included in the extracted image data is a predetermined distribution. Thus, the additional data is added to the pattern image data to resize the pattern.
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申请公布号 |
US4942619(A) |
申请公布日期 |
1990.07.17 |
申请号 |
US19880289428 |
申请日期 |
1988.12.23 |
申请人 |
NIKON CORPORATION |
发明人 |
TAKAGI, MAKOTO;FUJII, NORIO;FUJIMORI, YOSHIHIKO |
分类号 |
G01N21/956;G06T7/00 |
主分类号 |
G01N21/956 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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