| 发明名称 |
Pattern forming composition and process for forming pattern using the same. |
| 摘要 |
<p>A negative-type pattern (6) forming composition comprising (a) a silanol compound having one or more hydroxyl groups in average bonded to one silicon atom, and (b) an acid precursor, and if necessary, (c) an alkali-soluble resin, can give a pattern (6) with high sensitivity and high resolution.</p> |
| 申请公布号 |
EP0377175(A2) |
申请公布日期 |
1990.07.11 |
| 申请号 |
EP19890123670 |
申请日期 |
1989.12.21 |
| 申请人 |
HITACHI, LTD.;HITACHI CHEMICAL COMPANY LTD. |
发明人 |
SHIRAISHI, HIROSHI;UENO, TAKUMI;HAYASHI, NOBUAKI;FUKUMA, EMIKO;TORIUMI, MINORU |
| 分类号 |
G03F7/075;H01B5/14;H01B13/00;H01L21/027 |
主分类号 |
G03F7/075 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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