发明名称 PROCESS FOR PRODUCING LIGHT-SENSITIVE LITHOGRAPHIC PLATE REQUIRING NO DAMPENING SOLUTION
摘要 <p>A process for producing a light-sensitive lithographic plate requiring no dampening solution comprising (1) carrying out corona discharge treatment on the surface of a silicone rubber layer of a light-sensitive lithographic plate requiring no dampening solution wherein the silicone rubber layer is the top layer, (2) spraying a solution or dispersion containing a non-volatile solid component on said silicone rubber layer, and (3) drying to provide fine projection patterns on said silicone rubber layer.</p>
申请公布号 EP0154981(B1) 申请公布日期 1990.07.11
申请号 EP19850102839 申请日期 1985.03.12
申请人 FUJI PHOTO FILM CO., LTD. 发明人 TAKAHASHI, HIROSHI;TAMAKI, HIROYUKI;OHISHI, CHIKASHI;SHIBA, KEISUKE
分类号 G03F7/00;G03F7/075;G03F7/115 主分类号 G03F7/00
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