发明名称 MANUFACTURE OF AMORPHOUS SEMICONDUCTOR PHOTOVOLTAIC ELEMENT
摘要 PURPOSE:To dispense with a mask aligning process by a method wherein an upper electrode patterned through a screen printing on the surface of an amorphous semiconductor layer is formed by etching, and the upper electrode and a base electrode sandwiching the amorphous semiconductor layer between them are thermally treated to make the thermally treated parts of them electrically connected with each other through the thermal diffusion of an electrode material. CONSTITUTION:An amorphous semiconductor layer 4 is formed on the whole surface of a substrate 2, and an upper electrode 5 patterned through a screen printing on the amorphous semiconductor layer 4 is formed by etching. And, the upper electrode 5 and a base electrode sandwiching the semiconductor layer 4 between them are locally subjected to a heat treatment, and the thermally treated parts of them are electrically connected together though the thermal diffusion of electrode material. By this setup, a mask aligning process can be dispensed with and a workability is improved, and moreover as the patterning of the upper electrode 5 is made through printing, the material cost required for production, that is, the cost primarily required for masking can be reduced.
申请公布号 JPH02177571(A) 申请公布日期 1990.07.10
申请号 JP19880333154 申请日期 1988.12.28
申请人 TAIYO YUDEN CO LTD 发明人 UENO TAKESHI;MONNO KOJI
分类号 H01L31/04;H01L29/40 主分类号 H01L31/04
代理机构 代理人
主权项
地址