| 摘要 |
PURPOSE:To align a pattern highly accurately by installing the following: a condensing mirror which condenses X-rays with which a mask is irradiated; a reflecting-mirror optical system which is constituted of one or two aspheraical mirrors or of one spherical mirror out of the two mirrors. CONSTITUTION:The following are provided: a condensing mirror 11 which condenses X-rays; a reflecting-mirror optical system 15 which is composed of one or two aspherical mirrors or of one spherical mirror out of the two mirrors. X-rays are condensed, by using the condensing mirror 11, toward one point on an optical axis of the reflecting-mirror optical system 15; a pattern on a mask is irradiated with the X-rays; the pattern is projected in such a way that a principal ray is incident nearly perpendicularly on a specimen face by using the reflecting-mirror optical system 15. Thereby, a dislocation of the pattern by an up-and-down fluctuation of the specimen face, i.e. a water face, is not caused; a positional accuracy of a highly accurate pattern can be obtained. In addition, since the number of mirrors for the reflecting-mirror optical system 15 is small at one or two, a drop in an optical intensity by a reflection factor of a multilayer mirror is small; the pattern can be transcribed at high speed. |
