| 摘要 |
PURPOSE:To eliminate the need for establishing strict process conditions required for manufacturing surface acoustic wave elements and improve the stability as well as the yielding rate of manufacturing the elements by providing a process to form a reflection reducing film at the rear of a substrate previous to a process to expose to the substrate through a photomask. CONSTITUTION:A reflection reducing film 6 is formed on the rear of a substrate 1 previous to a process to expose to the substrate 1 through a photomask 4. As rays of light are thus absorbed to the reflection reducing film 6, no scattering of the rays of light takes place and light irradiation is just performed to only an objective resist part. In an exposure process, even though the rays of light coming into the substrate 1 reach the base, they are absorbed by the reflection reducing film 6 mounted on the base and then, no scattering of waves 5b takes place and irradiation of the rays of light is performed to only an objective resist part. |
