发明名称 ELECTRONIC PARTS PACKAGE WITH RHENIUM LAYER AT METAL PART
摘要 <p>PURPOSE:To improve bonding resistance, heat resistance, let-go performance due to lead bending, and wettabilities on solder dipping by using a rhenium plating film at a ground layer for a metal plating layer to be provided at a metal part of a package. CONSTITUTION:A ceramic substrate 1 has pads 2 such as a die-bonding part, a wire bonding part, and a lead connection part and tungsten or molybdenum are metallized on the pads 2. Then, with a first nickel film 3, nickel is formed at the pads 2 by electroless plating or electrical plating. Then, a lead for external introduction 11 is mounted on a silver solder material 7. Then, a second nickel film 4 is formed 2-5mum in thickness by electrical plating. A rhenium film 5 is formed on a nickel film 4, thus preventing nickel from being exposed to the surface of a metal film.</p>
申请公布号 JPH02174253(A) 申请公布日期 1990.07.05
申请号 JP19880330597 申请日期 1988.12.27
申请人 MITSUBISHI MINING & CEMENT CO LTD 发明人 MIYAZAWA OSAMU
分类号 C25D5/10;H01L23/50;H05K5/06 主分类号 C25D5/10
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