发明名称 VAPOR DEPOSITION JIG
摘要 <p>PURPOSE:To prevent a metallic mask made of a soft magnetic material from being dislocated from the prescribed position by magnetizing a permanent magnet which attracts the metallic mask while pinching a semiconductor wafer so that the magnetizing direction is made vertical to the attracting face and the magnetic poles are made mutually reverse directions in both the outer peripheral part and the inner center part. CONSTITUTION:A metallic mask 2 made of a soft magnetic material is attracted by a permanent magnet 5 supported with an outer circumferential holder 4 so that a semiconductor wafer 1 is pinched. Soldered bumps are formed on the semiconductor wafer 1 by vacuum deposition. A vapor deposition jig is constituted by magnetizing the permanent magnet 5 so that the magnetizing direction is made vertical to the attracting direction and the magnetic poles are made reverse in both the outer peripheral part and the inner center part, for example, so that the outer peripheral part is made the N pole and the inner center part is made the S pole. Thereby the lines 6 of magnetic force emitted from the permanent magnet 5 are made doughnut-shapes different in the direction. Even when the position of the metallic mask 2 which is attracted while pinching the wafer 1 is dislocated, the lines 6 of magnetic force perform action for pulling the metallic mask 2 back to the center and thereby this metallic mask can be fixed to the prescribed position.</p>
申请公布号 JPH02173257(A) 申请公布日期 1990.07.04
申请号 JP19880326119 申请日期 1988.12.26
申请人 FUJITSU LTD 发明人 YAMADA TAKESHI;NAKANISHI TERU;KARASAWA KAZUAKI;OKAMOTO SHIGEKI
分类号 C23C14/04;H01L21/68;H01L21/683 主分类号 C23C14/04
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