发明名称 Apparatus for producing a plasma and for the treatment of substrates
摘要 The plasma produced by means of microwaves in the presence of a magnetic field and a gas serves to coat a substrate which is situated in a chamber having metal walls. The microwaves are repeatedly reflected at the metal walls, so that the chamber has numerous microwave modes. By means of permanent magnets, which are placed either inside the chamber or outside the chamber in the vicinity of the substrate that is to be coated, it is possible to produce within this chamber an electron-cyclotron resonance which permits a locally controlled ignition of the plasma.
申请公布号 US4939424(A) 申请公布日期 1990.07.03
申请号 US19890355886 申请日期 1989.05.23
申请人 LEYBOLD AKTIENGESELLSCHAFT 发明人 KIESER, JOERG;GEISLER, MICHAEL;WILHELM, ROLF;RAEUCHLE, EBERHARD
分类号 H05H1/46;C23C16/40;C23C16/44;C23C16/50;C23C16/511;H01J37/32 主分类号 H05H1/46
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