RADIATION SENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THIS COMPOSITION

摘要

PURPOSE:To enhance the sensitivity and resolution to active radiations of the compsn. and to shorten the time for baking after exposing by using a prescribed compd. which generates an acid by irradiation of radiations and a prescribed phenolic resin. CONSTITUTION:This compsn. consists of the compd. (A) which generates an acid by irradiation of the radiations and the alkali soluble phenolic resin (B) contg. a methoxymethyl group or/and methylol group. After the above-mentioned compsn. is applied on the substrate and is prebaked, patterns are transferred thereto by irradiation of the radiations. The compsn. is then developed with an alkaline developing soln. to obtain the negative type patterns. An onium salt, such as diaryl iodonium salt is usable for the component A and an alkaline soluble high-polymer compd. contg. the unit expressed by the formula is preferably used for the component B. In the formula R denotes H, methyl; n, m denotes 1, 2.