发明名称 INTEGRIERTE SCHALTUNG UND VERFAHREN ZUM ANLEGEN EINER VORSPANNUNG AN EINE EPITAKTISCHE SCHICHT.
摘要 An integrated circuit and method for biasing an impurity region, in particular an epitaxial layer, to a level substantially equal to a supply voltage level yet exhibiting a high reverse breakdown voltage to negative transients of the supply voltage. The integrated circuit and method is of especial utility in power BIMOS and other applications having the substrate at or near the supply voltage level.
申请公布号 DE3577947(D1) 申请公布日期 1990.06.28
申请号 DE19853577947 申请日期 1985.02.21
申请人 MOTOROLA, INC., SCHAUMBURG, ILL., US 发明人 BYNUM, G., BYRON, TEMPEA, AZ 85283, US;CAVE, L., DAVID, TEMPE, AZ 85282, US
分类号 H01L27/04;H01L21/761;H01L21/822;H01L27/02;H01L27/06;H01L27/07;H01L29/78 主分类号 H01L27/04
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