| 摘要 |
PURPOSE:To form a light shielding layer which eliminates the damages on picture element electrodes and other electrodes at the time of production, withstands a high temp., is thin in film thickness and can shield light in the regions between the picture elements with good positional accuracy by forming the light shielding layer consisting of an acrylic resin having a crosslinking structure. CONSTITUTION:The light shielding layer 10 consisting of the acrylic resin having the crosslinking structure dispersed with carbon black is formed between the picture element electrodes 6 on a glass substrate 2 and on TFTs 8. The acrylic resin having the crosslinking structure can be formed by exposing, developing and etching a negative photoresist consisting of the acrylic resin and a photopolymn. initiator. The light shielding layer 10 which is increased in the thickness of the layer, withstands the high temp., and does not damage the picture element electrodes 6 and the other electrodes at the time of production is obtd. in this way. |
