| 发明名称 |
Defect detection system and method for pattern to be inspected. |
| 摘要 |
<p>A defect detection system and method for a pattern to be inspected wherein multiple-focus images of the pattern to be inspected are obtained and a defect on the pattern to be inspected is detected utilizing the multiple-focus images.</p> |
| 申请公布号 |
EP0374694(A2) |
申请公布日期 |
1990.06.27 |
| 申请号 |
EP19890122913 |
申请日期 |
1989.12.12 |
| 申请人 |
HITACHI, LTD. |
发明人 |
MAEDA, SHUNJI;KUBOTA, HITOSHI |
| 分类号 |
G01B11/24;G01N21/88;G01N21/93;G01N21/94;G01N21/956;G06T1/00;H01L21/66 |
主分类号 |
G01B11/24 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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