| 摘要 |
<p>An apparatus for treating silicon wafers in an acid bath, comprising at least one advantageously quartz tank (1) for containing an acid in which the wafers are immersed and with which electrical resistors (14) are associated for heating said acid, said tank (1) being positioned during use in a usual process bench or wet hood (3). The tank (1) comprises tubular ducts (5), advantageously of quartz, which are closed at one end (6) and positioned transversely in said tank (1), and which open (at 7) into one of its sides (8), said tubular ducts (5) being arranged to removably receive the electrical resistors (14), which are removably connected to the process bench.</p> |
