发明名称 Hydrofluoric acid reprocessing for semiconductor standards
摘要 A two-step distillation process provides semiconductor purity, concentrated hydrofluoric acid. Further, the distillation process, occurring under reduced pressures eliminates essentially pure water after the first distillation step. The product output of the second distillation process provides an acid of weight percent greater than 27 weight percent. The product acid is carefully diluted to the required concentrations during the dilution step.
申请公布号 US4936955(A) 申请公布日期 1990.06.26
申请号 US19880231850 申请日期 1988.08.12
申请人 ALAMEDA INSTRUMENTS, INC. 发明人 DOBSON, JESSE;MCCORMICK, MARSHALL
分类号 B01D3/10;C01B7/19;C23F1/46 主分类号 B01D3/10
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