发明名称 |
Hydrofluoric acid reprocessing for semiconductor standards |
摘要 |
A two-step distillation process provides semiconductor purity, concentrated hydrofluoric acid. Further, the distillation process, occurring under reduced pressures eliminates essentially pure water after the first distillation step. The product output of the second distillation process provides an acid of weight percent greater than 27 weight percent. The product acid is carefully diluted to the required concentrations during the dilution step.
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申请公布号 |
US4936955(A) |
申请公布日期 |
1990.06.26 |
申请号 |
US19880231850 |
申请日期 |
1988.08.12 |
申请人 |
ALAMEDA INSTRUMENTS, INC. |
发明人 |
DOBSON, JESSE;MCCORMICK, MARSHALL |
分类号 |
B01D3/10;C01B7/19;C23F1/46 |
主分类号 |
B01D3/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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