| 摘要 |
Compounds of the general formula I (I) are described in which R1 is a group of the formula and R2 is a hydrogen atom or a methyl group, or R1 and R2 jointly form an optionally substituted 5- or 6-membered ring, R3 is a hydrogen atom, a methyl group or an optionally substituted phenyl group, R4 is a hydrogen or halogen atom, a methyl group, an optionally substituted benzoyl group or a group of the formula n is zero or 1, X is a hydrogen or chlorine atom, an alkyl group containing 1 to 4 carbon atoms or one of the groups OA, CH2OA, CH2NHA or C2H4OA, and A is an acryloyl or methacryloyl group, the compounds containing in each case at least one group A. The compounds are suitable for the production of photoresists and printing plates as diffusion-resistant photoinitiators in photopolymerizable mixtures.
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