发明名称 MANUFACTURE OF CONDUCTIVE HIGH MOLECULAR COMPLEX FILM UTILIZING PHOTOSENSITIZATION
摘要 <p>PURPOSE:To make it possible to obtain a conductive high molecular complex film which is readily formed into a desired pattern, by applying a solution on a base to form a film of high molecular materials containing a pyrrole group and an electrolyte, and irradiating the film with light under the presence of an optical sensitizer. CONSTITUTION:A high molecular film is formed by application of a solution containing an electrolyte and high molecular materials on a base, the electrolyte containing a pyrrole group and those positive ions among oxidation-reduction pairs which have small oxidation number, the standard electrode potential of which pairs locates between the potential of the pyrrole group and that of a sensitizer. The film is excited and immersed in a solution containing an optical sensitizer which exhibits a greater electrode potential than the oxidation current threshold potential of the pyrrole group, and the film is irradiated with light through a mask with a desired pattern, the wavelength of light being within the absorption spectrum of the sensitizer, Negative ions in the electrolyte are doped into polymers simultaneously with the oxidation polymerization of the pyrrole group which occurs due to its photosensitization. A conductive high molecular complex film, on which conductive pyrrole group polymers having negative ions incorporated therewith are formed into a desired pattern, can thus be obtained.</p>
申请公布号 JPH02160314(A) 申请公布日期 1990.06.20
申请号 JP19880312863 申请日期 1988.12.13
申请人 RICOH CO LTD 发明人 TAKAKUBO MASAAKI
分类号 B05D3/06;B05D7/24;C08G61/10;C08G61/12;H01B13/00;H01C17/06;H05K3/10 主分类号 B05D3/06
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