发明名称 |
InP/GalnAsP double heterostructure laser diode with buried active layer, and method for its production. |
摘要 |
<p>InP/GaInAsP double heterostructure laser diode with buried active layer, and method for its production. The InP/GaInAsP laser diode containing a built-in isolating p-n junction with a double channeled double heterostructure carrier, and a buried active layer built up on an InP substrate, is prepared by using the method of one-step liquid phase epitaxy, wherein on the orientated substrate (1) there are formed two parallel channels (9), between which channels (9) a buried GaInAsP active layer (3a) is arranged, which is confined on all sides by n and p type InP layers with a wide inhibiting zone and a low refractive index. On the substrate (1) there is a n-type InP buffer layer (2) and thereon a further GaInAsP layer (3) with narrow gap and lying at the bottom of the channels (9) and on the planar parts, whereon a further n-type layer (4) is arranged carrying a further n-type current-limiting layer (5), whereon an InP embedding layer (6) is provided on which a GaInAsP contact layer (7) of the p-type is arranged, while this one is covered with a multilayer p-side contact-metal layer (8a), advantageously of Au/Au-Zn , while on the other side of the carrier a n-side contact-metal layer (8b) is directly arranged, preferably consisting of AuGe/Ni/Au.</p> |
申请公布号 |
EP0373637(A2) |
申请公布日期 |
1990.06.20 |
申请号 |
EP19890123072 |
申请日期 |
1989.12.13 |
申请人 |
MAGYAR TUDOMANYOS AKADEMIA MUSZAKI FIZIKAI KUTATO INTEZETE |
发明人 |
RAKOVICS, VILMOS,;LENDVAY, ODON DR.,;LABADI, ZOLTAN,;HABERMAYER, ISTVAN DR., |
分类号 |
H01S5/00;H01L33/00;H01S5/227;H01S5/323 |
主分类号 |
H01S5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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