GENERATION OF RELIEF PATTERN AND USE

摘要

PURPOSE: To improve durability against plasma including oxygen by exposing a part of a polymer material layer to active rays and bringing a specified polyfunctional org. metal material into contact with the layer to make the thickness of the layer in the exposed part different from the thickness of the layer in an unexposed part. CONSTITUTION: A photosensitive polymer material layer containing functional groups with reactive hydrogen and/or precursors of reactive hydrogen functional groups is partly exposed to active rays to change amt. of hydrogen functional groups in the exposed part. The layer is then brought into contact with a polyfunctional org. metal material. The polyfunctional org. metal material has at least two functional groups which reacts with the reactive hydrogen groups of the polymer material and make the thickness of the layer in the exposed part different from the thickness in an unexposed part. Thereby, the obtd. pattern is stable at high temp. and has good durability against an org. solvent.