发明名称 |
Metallic fuse with optically absorptive layer |
摘要 |
A metallic interconnect includes a fuse portion that is readily vaporized upon exposure to the radiant energy of a laser. A layer of optically absorptive material is formed on top of an aluminum based metallic interconnect and together they are formed by a photolithographic and etch technique into a fuse portion. A low energy laser having a Gaussian energy distribuution focused on the absorptive layer produces heat in the absorptive layer. The heat is transferred to the underlying aluminum based interconnect. The concentration of energy made possible by the absorptive layer allows the low energy laser to blow the fuse thereby producing an electrical open in the interconnect without damaging surrounding silicon substrate and/or polysilicon structures below or nearby the metal fuse.
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申请公布号 |
US4935801(A) |
申请公布日期 |
1990.06.19 |
申请号 |
US19890304361 |
申请日期 |
1989.01.30 |
申请人 |
INMOS CORPORATION |
发明人 |
MCCLURE, PAUL J.;JONES, JR., ROBERT E. |
分类号 |
H01L21/768;H01L23/525 |
主分类号 |
H01L21/768 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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