| 摘要 |
PURPOSE:To form uniform patterns over the entire surface of a substrate by rotating the substrate at the 1st rotating speed lower than the prescribed rotating speed from the time when the dropping of a developing soln. is started to develop good affinity between the substrate surface and the developing soln., then increasing the rotating speed and making development at the prescribed 2nd rotating speed. CONSTITUTION:The developing soln. flows over the entire surface of the substrate 1 when the substrate 1 is rotated at 150rpm 1st rotating speed lower than the prescribed rotating speed from, for example, the time t1 when the dropping of the developing soln. is started. The rotating speed (r) of the substrate 1 is raised to 450prm prescribed 2nd rotating speed while the dropping of the developing soln. 2 is continued after prescribed 10 seconds from the time t1 when the dropping of the developing soln. is started; further, the development is executed for 60 seconds. The entire surface of the substrate 1 is already covered with the developing soln. 2 and the good affinity between the surface of the substrate 1 and the developing soln. 2 is developed. The stria flow of the developing soln. 2 is diminished. Since the developing soln. 2 is uniformly supplied to the entire surface of the substrate 1 in this way, the uniform patterns are formed over the entire surface of the substrate 1. |
