Thin film pattern and method of forming the same.

摘要

A thin film pattern and a method of fabricating the thin film pattern available for an ultrasonic transducer are disclosed. That is, an oriented thin film (2) made of a material different from the material of a substrate (1) is formed on the substrate, a mask (3, 4) having a predetermined pattern is formed on the thin film, and anisotropic etching is carried out for the thin film in accordance with the predetermined pattern of the mask, by using an etchant for selectively etching a predetermined crystallographic plane parallel to the surface of the thin film, to form the predetermined pattern in the thin film, thereby obtaining a thin film pattern.