| 摘要 |
A method of making a cutting edge, which comprises coating a substrate cutting edge having a defined cross-sectional geometry, with a material which is harder than the material of the substrate cutting edge by a vapor deposition or sputtering process, if necessary in the presence of gaseous or vaporized molecules of another element or a compound of another element where it is desired to form the coating of a compound, at a pressure of less than 10-2 m bar, while simultaneously subjecting the cutting edge to ion bombardment with ions of sufficient mass and energy to cause sputter removal of the deposited material at a rate which is less than the rate of deposition, whereby a cutting edge formed of the deposited material and having a defined cross-sectional geometry and ultimate tip radius, is obtained.
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