发明名称 SYNCHROTRON RADIATION EXPOSURE APPARATUS
摘要 PURPOSE:To enhance reliability of a device so as to put it into practice by housing an oscillation mirror inside a multiple vacuum chamber. CONSTITUTION:Synchrotron radiation light 2 radiated from a storage ring 1 serving as a synchrotron radiation source is introduced to a beam line 3, is reflected on an oscillation mirror 5 housed inside a second vacuum chamber 8 contained in a mirror box 14, and then, is injected into an exposure device 6. Only the inside of the chamber 8 is exhausted into an ultra-high vacuum, while the inside of the mirror box 14 outside of the chamber 8 is exhausted into a vacuum (10<-7>-10<-8>Torr) a little inferior to that inside the chamber 8.
申请公布号 JPH02152200(A) 申请公布日期 1990.06.12
申请号 JP19880305978 申请日期 1988.12.05
申请人 NEC CORP 发明人 OKADA KOICHI
分类号 H05H13/04;H01L21/027;H01L21/30 主分类号 H05H13/04
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